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NTPF Etalon Ltd. has mastered the production of SHS-silicon nitride by the method of self-propogating high-temperature synthesis (SHS). The new material is produced in a special reactors at the pressure of ~10 MPa and the temperature of ~2000 °C. The offered technology allows to obtain a high quality product with a minimum concentration of oxygen. Unlike analog, produced in the furnaces, the principal phase of SHS-silicon nitride is a high-temperature "beta" modification (β-Si₃N₄). Such material has improved resistance to melts of non-ferrous metals and iron and is specially designed for refractory production. SHS-silicon nitride is manufactured of two grades: NK1 and NK2 (table).

Chemical composition of SHS-silicon nitride for refractory production

Grain size 0–0,315 mm; other – by the customer require.

Other refractory materials

• Ferrosilicon nitride NITRO-FESIL^® N30
• Antioxidants for carbon-bearing refractory materials BorTiX^®